Planar technology and instrumentation
These technical systems are designed to support research. This is a team of 7 people which is open to industrial and academic partners.
The facilities are dedicated to 4 areas:
- Gratings elaboration
- Thin film deposition
- Processing substrates
- Profile analysis
Profile analysis
Nikon binocular
Atomic force microscope equipped Agilent 5500 platinum nano piezo positioning platform and large samples
Atomic force microscope Veeco DI Caliber
Leica Microscope FTM 200 with visually...
Processing substrates
Annealsys Rapid Thermal Annealing system AS One 100
Safety drying chambers:Volume 77 litres and 158 litres, 300°C max
Constant climate chambers: Volume 734 litres, -10°C to 100°C 10% RH to 98% RH
Oxygen...
Thin film deposition
DC/RF Sputtering System Alcatel SCM 450 and 650:
Thins films Al , Si, AlN, Ag, Cu, Cr etc. Maximum Substrats 6 inches
Thickness: 20 nm to 500 nm
Joule effect evaporation source: Au, Ag, Ni, Al, Pd, MgF2
Gratings elaboration
Various resist gratings can be elaborated: photo masking up to 500nm and holographic exposure ≤100nm
These resist gratings can be etched in the substrate by RIBE technology
Logistics :
Holographic exposure...