Gratings elaboration
Various resist gratings can be elaborated: photo masking up to 500nm and holographic exposure ≤100nm
These resist gratings can be etched in the substrate by RIBE technology
Logistics :
- Holographic exposure bench
- Karl Süss MA6 Mask printing 4 inches
- Mask aligner SET 702 4 inches
- Wet Bench Fluidair acide/solvants
- Spin-coating 4 inches
- Hot-plate 6 inches
- Drying Recif 4 inches
- Reactive ion beam etching system ion source Oxford 6 inches: ectching possibility material glass, SiO2, Germanium, Ta2O5, HfO2, TiO2 etc.