NanoSaintÉtienne

Planar technology and instrumentation

  

These technical systems are designed to support research. This is a team of 7 people which is open to industrial and academic partners.

The facilities are dedicated to 4 areas:

  • Gratings elaboration
  • Thin film deposition
  • Processing substrates
  • Profile analysis


    • Contact the characterization platform

       
       

      Read more

    • Profile analysis

      Nikon binocular
      Atomic force microscope equipped Agilent 5500 platinum nano piezo positioning platform and large samples

      Atomic force microscope Veeco DI Caliber
       Leica Microscope FTM 200 with visually...

      Read more

    • Processing substrates

      Annealsys Rapid Thermal Annealing system AS One 100

      Safety drying chambers:Volume 77 litres and 158 litres, 300°C max
      Constant climate chambers: Volume 734 litres, -10°C to 100°C 10% RH to 98% RH

      Oxygen...

      Read more

    • Thin film deposition

      DC/RF Sputtering System Alcatel SCM 450 and 650:
      Thins films Al , Si, AlN, Ag, Cu, Cr etc. Maximum Substrats  6 inches
      Thickness: 20 nm to 500 nm

      Joule effect evaporation source: Au, Ag, Ni, Al, Pd, MgF2

      Read more

    • Gratings elaboration

      Various resist gratings can be elaborated: photo masking up to 500nm and holographic exposure ≤100nm

      These resist gratings can be etched in the substrate by RIBE technology

      Logistics :
      Holographic exposure...

      Read more