Planar technology and instrumentation

Planar technology and instrumentation

  

These technical systems are designed to support research. This is a team of 7 people which is open to industrial and academic partners.

The facilities are dedicated to 4 areas:

  • Gratings elaboration
  • Thin film deposition
  • Processing substrates
  • Profile analysis


    • Contact the characterization platform

       
       

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    • Profile analysis

      Nikon binocular
      Atomic force microscope equipped Agilent 5500 platinum nano piezo positioning platform and large samples

      Atomic force microscope Veeco DI Caliber
       Leica Microscope FTM 200 with visually...

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    • Processing substrates

      Annealsys Rapid Thermal Annealing system AS One 100

      Safety drying chambers:Volume 77 litres and 158 litres, 300°C maxConstant climate chambers: Volume 734 litres, -10°C to 100°C 10% RH to 98% RH

      Oxygen...

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    • Thin film deposition

      DC/RF Sputtering System Alcatel SCM 450 and 650:Thins films Al , Si, AlN, Ag, Cu, Cr etc. Maximum Substrats  6 inchesThickness: 20 nm to 500 nm

      Joule effect evaporation source: Au, Ag, Ni, Al, Pd, MgF2

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    • Gratings elaboration

      Various resist gratings can be elaborated: photo masking up to 500nm and holographic exposure ≤100nm

      These resist gratings can be etched in the substrate by RIBE technology

      Logistics :
      Holographic exposure...

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