Seminar by Victor Vallejo Otero: "Micro-nanostructuring by optical lithography and nitriding of photo-patternable TiO2 and ZrO2 sol-gel to obtain respectively micro-nanostructured TiN and ZrN films."

"Micro-nanostructuring by optical lithography and nitriding of photo-patternable TiO2 and ZrO2 sol-gel to obtain respectively micro-nanostructured TiN and ZrN films."

Abstract

Titanium and zirconium nitride (TiN and ZrN) combine plasmonic properties in the visible and near-infrared spectral regions with excellent mechanical properties, high thermal stability, and chemical durability. These attributes make them highly promising alternatives to noble metals for optical applications at high temperatures or in extreme environments.
A new process for fabricating micro- and nanostructured TiN and ZrN using a photo-patternable TiO₂ and ZrO₂ sol-gel, followed by a nitridation process via rapid thermal annealing, will be presented. This sol-gel is compatible with optical lithography, enabling the efficient and rapid production of patterned TiN and ZrN layers through rapid thermal annealing.

This seminar will be held in English.